Facile process to clean PMMA residue on graphene using KrF...

Facile process to clean PMMA residue on graphene using KrF laser annealing

Hwang, Hyeon Jun, Lee, Yongsu, Cho, Chunhum, Lee, Byoung Hun
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Volume:
8
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.5051671
Date:
October, 2018
File:
PDF, 4.16 MB
english, 2018
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