Facile process to clean PMMA residue on graphene using KrF laser annealing
Hwang, Hyeon Jun, Lee, Yongsu, Cho, Chunhum, Lee, Byoung HunVolume:
8
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.5051671
Date:
October, 2018
File:
PDF, 4.16 MB
english, 2018