A 0.18μm LDMOS with Excellent Ronsp and Uniformity by...

  • Main
  • 2018
  • A 0.18μm LDMOS with Excellent Ronsp and Uniformity by...
IEEE Transactions on Semiconductor Manufacturing 2018

A 0.18μm LDMOS with Excellent Ronsp and Uniformity by Optimized Manufacture Process

Mao, Kun, Wang, Hai Shi, Yao, Yao, Nie, Hai, Chen, Gong, Zhou, Juan, Chen, Zhu, Du, Jiang
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2018
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2018.2879215
File:
PDF, 928 KB
english, 2018
Conversion to is in progress
Conversion to is failed