Influence of the growth conditions of LT-AlN on quality of HT-AlN growth on Si (111) by metalorganic chemical vapor deposition
Chernykh, M.Y., Ezubchenko, I.S., Mayboroda, I.O., Zanaveskin, M.L.Language:
english
Journal:
Journal of Crystal Growth
DOI:
10.1016/j.jcrysgro.2018.11.020
Date:
November, 2018
File:
PDF, 1.19 MB
english, 2018