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Influence of pressure on the properties of AlN deposited by DC reactive magnetron sputtering on Si (100) substrate
Li, Tao, Han, Jun, Xing, Yanhui, Deng, Xuguang, Li, Junshuai, Zhang, Li, Shi, Fengfeng, Yu, Lun, Sun, Chi, Zhang, Xiaodong, Zhang, BaoshunLanguage:
english
Journal:
Micro & Nano Letters
DOI:
10.1049/mnl.2018.5293
Date:
October, 2018
File:
PDF, 352 KB
english, 2018