Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2018 / 11 Vol. 36; Iss. 6
Broadband UV-assisted thermal annealing of low- k silicon carbonitride films using a C-rich silazane precursor
Chang, Wei-Yuan, Chung, Hau-Ting, Chen, Yi-Chang, Leu, JihperngVolume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/1.5063294
Date:
November, 2018
File:
PDF, 437 KB
english, 2018