Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
Li, Xing, Lu, Hong-Liang, Ma, Hong-Ping, Yang, Jian-Guo, Chen, Jin-Xin, Huang, Wei, Guo, Qixin, Feng, Ji-Jun, Zhang, David WeiLanguage:
english
Journal:
Current Applied Physics
DOI:
10.1016/j.cap.2018.11.013
Date:
November, 2018
File:
PDF, 1.79 MB
english, 2018