Ultralarge Area Sub-10-nm Plasmonic Nanogap Array by Block...

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Ultralarge Area Sub-10-nm Plasmonic Nanogap Array by Block Copolymer Self-Assembly for Reliable High Sensitivity SERS

Jin, Hyeong Min, Kim, Ju Young, Heo, Min Sung, Jeong, Seong-Jun, Kim, Bong Hoon, Cha, Seung Keun, Han, Kyo Hyo, Kim, Jang Hwan, Yang, Geon Gug, Shin, Jonghwa, Kim, Sang Ouk
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Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.8b17325
Date:
November, 2018
File:
PDF, 805 KB
english, 2018
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