Development of Dissolution Inhibitor in Chemically...

Journal of Photopolymer Science and Technology 2018 / 6 Vol. 31; Iss. 3

Development of Dissolution Inhibitor in Chemically Amplified Positive Tone Thick Film Resist

Sotokawa, Yusuke, Nishiyama, Takashi, Sato, Eriko, Horibe, Hideo
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Volume:
31
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.31.399
Date:
June, 2018
File:
PDF, 1.00 MB
english, 2018
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