A global model study of low pressure high density CF4...

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Plasma Sources Science and Technology 2018 / 11

A global model study of low pressure high density CF4 discharge

Toneli, David Arruda, Pessoa, Rodrigo Savio, Roberto, Marisa, Gudmundsson, Jon Tomas
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Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/1361-6595/aaf412
Date:
November, 2018
File:
PDF, 740 KB
english, 2018
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