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Facile fabrication of ultraviolet-protective silk fabrics via atomic layer deposition of TiO 2 with subsequent polyvinylsilsesquioxane modification
Yang, Huiyu, Wang, Yaling, Liu, Keshuai, Liu, Xin, Chen, Fengxiang, Xu, WeilinLanguage:
english
Journal:
Textile Research Journal
DOI:
10.1177/0040517518813626
Date:
December, 2018
File:
PDF, 1.38 MB
english, 2018