Electrochemical Behavior of Titanium Nitride Thin Films...

Materials Research 2016 / 08 Vol. 19; Iss. 5

Electrochemical Behavior of Titanium Nitride Thin Films Deposited on Silicon by Plasma Discharge Technique in Cathodic Cage

Bottoni, Cintia de Laet Ravani, Dias, Mauro César, Gontijo, L. C.
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Volume:
19
Language:
english
Journal:
Materials Research
DOI:
10.1590/1980-5373-mr-2015-0241
Date:
August, 2016
File:
PDF, 1.32 MB
english, 2016
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