Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2018 / 11 Vol. 36; Iss. 6
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Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
Kolkovsky, Vladimir, Scholz, Sebastian, Kolkovsky, Valery, Schmidt, Jan-Uwe, Heller, ReneVolume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/1.5045634
Date:
November, 2018
File:
PDF, 981 KB
english, 2018