Effects of gas residence time of CH 4 /H 2 on sp 2 fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition
Sugiura, Hirotsugu, Jia, Lingyun, Kondo, Hiroki, Ishikawa, Kenji, Tsutsumi, Takayoshi, Hayashi, Toshio, Takeda, Keigo, Sekine, Makoto, Hori, MasaruVolume:
57
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.57.06JE03
Date:
June, 2018
File:
PDF, 1.12 MB
english, 2018