Monte Carlo simulation of the implantation profile of e+ in...

The European Physical Journal D / Atomic, Molecular, Optical and Plasma Physics 2018 / 11 Vol. 72; Iss. 11

Monte Carlo simulation of the implantation profile of e+ in nanochanneled silicon

Guatieri, Francesco, Mariazzi, Sebastiano, Brusa, Roberto Sennen
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Volume:
72
Language:
english
Journal:
The European Physical Journal D
DOI:
10.1140/epjd/e2018-90344-y
Date:
November, 2018
File:
PDF, 2.35 MB
english, 2018
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