Silicon Film Deposition Using a Gas-Jet Plasma-Chemical...

Silicon Film Deposition Using a Gas-Jet Plasma-Chemical Method: Experiment and Gas-Dynamic Simulation

Sharafutdinov, R. G., Skovorodko, P. A., Shchukin, V. G., Konstantinov, V. O.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
59
Language:
english
Journal:
Journal of Applied Mechanics and Technical Physics
DOI:
10.1134/S0021894418050036
Date:
September, 2018
File:
PDF, 449 KB
english, 2018
Conversion to is in progress
Conversion to is failed