Silicon Film Deposition Using a Gas-Jet Plasma-Chemical Method: Experiment and Gas-Dynamic Simulation
Sharafutdinov, R. G., Skovorodko, P. A., Shchukin, V. G., Konstantinov, V. O.Volume:
59
Language:
english
Journal:
Journal of Applied Mechanics and Technical Physics
DOI:
10.1134/S0021894418050036
Date:
September, 2018
File:
PDF, 449 KB
english, 2018