Holographic interferometric microscopy for measuring Cu2+ concentration profile during Cu electrodeposition in a magnetic field
Nishikawa, Kei, Saito, Takaki, Matsushima, Hisayoshi, Ueda, MikitoVolume:
297
Language:
english
Journal:
Electrochimica Acta
DOI:
10.1016/j.electacta.2018.12.025
Date:
February, 2019
File:
PDF, 1.29 MB
english, 2019