From the Bottom-Up: Toward Area-Selective Atomic Layer...

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Chemistry of Materials 2018 / 12

From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity

Mackus, Adriaan J. M., Merkx, Marc J. M., Kessels, Wilhelmus M. M.
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Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/acs.chemmater.8b03454
Date:
December, 2018
File:
PDF, 4.51 MB
english, 2018
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