Ultraviolet Laser Damage Dependence on Contamination...

Materials 2018 / 04 Vol. 11; Iss. 4

Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process

Sun, Laixi, Shao, Ting, Shi, Zhaohua, Huang, Jin, Ye, Xin, Jiang, Xiaodong, Wu, Weidong, Yang, Liming, Zheng, Wanguo
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Volume:
11
Language:
english
Journal:
Materials
DOI:
10.3390/ma11040577
Date:
April, 2018
File:
PDF, 27.51 MB
english, 2018
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