Silicon etching of difluoromethane atmospheric pressure...

Japanese Journal of Applied Physics 2018 / 06 Vol. 57; Iss. 6S2

Silicon etching of difluoromethane atmospheric pressure plasma jet combined with its spectroscopic analysis

Sung, Yu-Ching, Wei, Ta-Chin, Liu, You-Chia, Huang, Chun
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Volume:
57
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.57.06JH02
Date:
June, 2018
File:
PDF, 1.17 MB
english, 2018
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