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Characterization of the morphology and composition of commercial negative resists used for lithographic processes
B.-E. Schuster, A. Haug, M. Häffner, M. M. Blideran, M. Fleischer, H. Peisert, D. P. Kern, T. ChasséVolume:
393
Language:
english
Pages:
7
DOI:
10.1007/s00216-008-2513-y
Date:
April, 2009
File:
PDF, 412 KB
english, 2009