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Film materials based on a-SiNx:H with high refractive index obtained by plasma enhanced chemical vapour deposition technology
Jaglarz, J., Jurzecka-Szymacha, M., Kluska, S.Volume:
669
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2018.11.050
Date:
January, 2019
File:
PDF, 1.33 MB
english, 2019