Influence of the growth parameters on TiO2 thin films...

Cerâmica 2002 / 12 Vol. 48; Iss. 308

Influence of the growth parameters on TiO2 thin films deposited using the MOCVD method

Bernardi, M. I. B., Lee, E. J. H., Lisboa-Filho, P. N., Leite, E. R., Longo, E., Souza, A. G.
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Volume:
48
Journal:
Cerâmica
DOI:
10.1590/s0366-69132002000400005
Date:
December, 2002
File:
PDF, 1.48 MB
2002
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