Chlorine-based inductive coupled plasma etching of α-Ga2O3

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Semiconductor Science and Technology 2019 / 01

Chlorine-based inductive coupled plasma etching of α-Ga2O3

Jian, Zhe, Oshima, Yuichi, Wright, Shawn, Owen, Kevin, Ahmadi, Elaheh
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Journal:
Semiconductor Science and Technology
DOI:
10.1088/1361-6641/aafeb2
Date:
January, 2019
File:
PDF, 774 KB
2019
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