Thermal study of multilayer resistive random access...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2019 / 01 Vol. 37; Iss. 1

Thermal study of multilayer resistive random access memories based on HfO 2 and Al 2 O 3 oxides

Cazorla, Manuel, Aldana, Samuel, Maestro, Marcos, González, Mireia Bargalló, Campabadal, Francesca, Moreno, Enrique, Jiménez-Molinos, Francisco, Roldán, Juan Bautista
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Volume:
37
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/1.5058294
Date:
January, 2019
File:
PDF, 2.17 MB
2019
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