Influence of topological constraints on ion damage...

Acta Materialia 2019 / 02 Vol. 165

Influence of topological constraints on ion damage resistance of amorphous hydrogenated silicon carbide

Su, Qing, Wang, Tianyao, Gigax, Jonathan, Shao, Lin, Lanford, William A., Nastasi, Michael, Li, Liyi, Bhattarai, Gyanendra, Paquette, Michelle M., King, Sean W.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
165
Language:
english
Journal:
Acta Materialia
DOI:
10.1016/j.actamat.2018.12.016
Date:
February, 2019
File:
PDF, 2.81 MB
english, 2019
Conversion to is in progress
Conversion to is failed