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Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
Krylov, Igor, Xu, Xianbin, Weinfeld, Kamira, Korchnoy, Valentina, Ritter, Dan, Eizenberg, MosheVolume:
37
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5075491
Date:
January, 2019
File:
PDF, 1.88 MB
english, 2019