Low- k dielectric etch...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2019 / 01 Vol. 37; Iss. 1

Low- k dielectric etch challenges at the 7 nm logic node and beyond: Continuous-wave versus quasiatomic layer plasma etching performance review

Lutker-Lee, Katie M., Lu, Yen-Tien, Lou, Qiaowei, Kaminsky, Jake, Kikuchi, Yuki, Raley, Angelique
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Volume:
37
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5079410
Date:
January, 2019
File:
PDF, 2.72 MB
english, 2019
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