Robust two-dimensional topological insulators in...

Applied Materials Today 2019 / 06 Vol. 15

Robust two-dimensional topological insulators in derivatives of group-VA oxides with large band gap: Tunable quantum spin Hall states

Zhou, Wenhan, Cai, Bo, Guo, Shiying, Zhang, Shengli, Hu, Xuemin, Qu, Hengze, Zeng, Haibo
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Volume:
15
Journal:
Applied Materials Today
DOI:
10.1016/j.apmt.2019.01.006
Date:
June, 2019
File:
PDF, 2.67 MB
2019
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