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The effects of silicon substrate thickness and annealing temperature on surface coverage for aluminum-induced crystallization of germanium films
McClure, Elisabeth L., Hubbard, Seth M.Volume:
94
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2019.01.030
Date:
May, 2019
File:
PDF, 2.88 MB
2019