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Nanometer-Resolution Mask Lithography with Matter Waves: Near-Field Binary Holography
Nesse, Torstein, Simonsen, Ingve, Holst, BodilVolume:
11
Journal:
Physical Review Applied
DOI:
10.1103/PhysRevApplied.11.024009
Date:
February, 2019
File:
PDF, 2.59 MB
2019