Effects of hydrogen-damaged layer on tin-doped indium oxide...

Japanese Journal of Applied Physics 2017 / 06 Vol. 56; Iss. 6S2

Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H 2 /Ar plasma

Hirata, Akiko, Fukasawa, Masanaga, Shigetoshi, Takushi, Okamoto, Masaki, Nagahata, Kazunori, Li, Hu, Karahashi, Kazuhiro, Hamaguchi, Satoshi, Tatsumi, Tetsuya
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Volume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.06HD02
Date:
June, 2017
File:
PDF, 969 KB
english, 2017
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