Analysis of Optical Plasma Monitoring in Plasma-Enhanced...

Journal of Nanoscience and Nanotechnology 2019 / 03 Vol. 19; Iss. 3

Analysis of Optical Plasma Monitoring in Plasma-Enhanced Atomic Layer Deposition Process of Al 2 O 3

Arshad, Muhammad Zeeshan, Tak, Hyun Woo, Kim, Hyun Gi, Hong, Sang Jeen
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Volume:
19
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2019.16198
Date:
March, 2019
File:
PDF, 8.87 MB
english, 2019
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