Stress and Microstructure Study of W/Si X-ray Multilayers...

Journal of Nanoscience and Nanotechnology 2019 / 01 Vol. 19; Iss. 1

Stress and Microstructure Study of W/Si X-ray Multilayers with Different Structural Parameters

Qi, Runze, Huang, Qiushi, Yang, Yang, Zhang, Zhong, Wang, Zhanshan
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Volume:
19
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2019.16473
Date:
January, 2019
File:
PDF, 8.30 MB
english, 2019
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