Morphology controlling of 〈111〉-3C–SiC films by HMDS flow rate in LCVD
Xu, Qingfang, Tu, Rong, Sun, Qingyun, Yang, Meijun, Li, Qizhong, Zhang, Song, Zhang, Lianmeng, Goto, Takashi, Ohmori, Hitoshi, Shi, Ji, Li, Haiwen, Kosinova, Marina, Bikramjit, BasuVolume:
9
Year:
2019
Language:
english
Journal:
RSC Advances
DOI:
10.1039/C8RA09509D
File:
PDF, 3.69 MB
english, 2019