Selective Electrodesorption-Based Atomic Layer Deposition...

Interface magazine 2018 Vol. 27; Iss. 2

Selective Electrodesorption-Based Atomic Layer Deposition (SEBALD) of Bismuth under Morphological Control

Giurlani, Walter, Giaccherini, Andrea, Salvietti, Emanuele, Passaponti, Maurizio, Comparini, Andrea, Morandi, Vittorio, Liscio, Fabiola, Cavallini, Massimiliano, Innocenti, Massimo
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Volume:
27
Year:
2018
Language:
english
Journal:
The Electrochemical Society Interface
DOI:
10.1149/2.F08182if
File:
PDF, 902 KB
english, 2018
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