CF 4 /H 2 Plasma Cleaning of Graphene Regenerates Electronic Properties of the Pristine Material
FERRAH, DJAWHAR, Renault, Olivier, Marinov, Daniil, Arias-Zapata, Javier, Chevalier, Nicolas, Mariolle, Denis, Rouchon, Denis, Okuno, Hanako, Bouchiat, Vincent, Cunge, GillesLanguage:
english
Journal:
ACS Applied Nano Materials
DOI:
10.1021/acsanm.8b02249
Date:
February, 2019
File:
PDF, 1.69 MB
english, 2019