Characterization of amorphous carbon films by PECVD and...

Characterization of amorphous carbon films by PECVD and plasma ion implantation: The role of fluorine and sulfur doping

de Oliveira Neto, Antonio M., Schreiner, Wido H., Justo, João F., de Oliveira, Alexandre M., Rangel, Elidiane C., Durrant, Steven F.
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Volume:
227
Language:
english
Journal:
Materials Chemistry and Physics
DOI:
10.1016/j.matchemphys.2019.02.008
Date:
April, 2019
File:
PDF, 1000 KB
english, 2019
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