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Low-Temperature MoS2 Film Formation using Sputtering and H2S Annealing
Shimizu, Junrichi, Ohashi, Takumi, Matsuura, Kentaro, Muneta, Iriya, Kakushima, Kuniyuki, Tsutsui, Kazuo, Ikarashi, Nobuyuki, Wakabayashi, HitoshiYear:
2018
Journal:
IEEE Journal of the Electron Devices Society
DOI:
10.1109/JEDS.2018.2854633
File:
PDF, 6 KB
2018