Gas barrier and mechanical properties of a single-layer...

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Plasma Processes and Polymers 2019 / 02

Gas barrier and mechanical properties of a single-layer silicon oxide film prepared by roll-to-roll PECVD system

Cho, Seong-Keun, Cho, Tae-Yeon, Lee, Won Jae, Um, Min Seop, Choi, Woo Jin, Lee, Jae-Heung, Ryu, Juwhan, Choa, Sung-Hoon
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Journal:
Plasma Processes and Polymers
DOI:
10.1002/ppap.201800170
Date:
February, 2019
File:
PDF, 1.91 MB
2019
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