Influence of cooling-induced edge morphology evolution during chemical vapor deposition on H 2 etching of graphene domains
Wang, Bin, Wang, Yuwei, Wang, Guiqiang, Zhang, QingguoVolume:
9
Year:
2019
Language:
english
Journal:
RSC Advances
DOI:
10.1039/c8ra09265f
File:
PDF, 564 KB
english, 2019