CMOS compatible metal stacks for suppression of secondary...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2019 / 03 Vol. 37; Iss. 2

CMOS compatible metal stacks for suppression of secondary grains in Sc 0.125 Al 0.875 N

Esteves, Giovanni, Berg, Morgann, Wrasman, Kyle D., David Henry, Michael, Griffin, Benjamin A., Douglas, Erica A.
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Volume:
37
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5065517
Date:
March, 2019
File:
PDF, 5.16 MB
english, 2019
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