Exploring the evolution of asymmetric pattern of mask hole...

Results in Physics 2019 / 03 Vol. 12

Exploring the evolution of asymmetric pattern of mask hole during plasma etching process by particle simulation method

Zhang, Peng
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
12
Language:
english
Journal:
Results in Physics
DOI:
10.1016/j.rinp.2019.02.013
Date:
March, 2019
File:
PDF, 2.04 MB
english, 2019
Conversion to is in progress
Conversion to is failed