Partial aliased effect number pattern and selection of...

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Partial aliased effect number pattern and selection of optimal compromise designs

Ye, Shili, Wang, Dongying, Zhang, Runchu
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Language:
english
Journal:
Metrika
DOI:
10.1007/s00184-018-00705-2
Date:
February, 2019
File:
PDF, 1.90 MB
english, 2019
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