[IEEE 2018 Non-Volatile Memory Technology Symposium (NVMTS) - Sendai (2018.10.22-2018.10.24)] 2018 Non-Volatile Memory Technology Symposium (NVMTS) - Improvement of Endurance and Data-retention in 40nm TaOX-based ReRAM by Finalize Verify
Fukuyama, Shouhei, Matsuda, Shinpei, Yasuhara, Ryutaro, Takeuchi, KenYear:
2018
DOI:
10.1109/NVMTS.2018.8603105
File:
PDF, 7 KB
2018