[IEEE 1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings - Santa Clara, CA, USA (11-13 Oct. 1999)] 1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) - A novel method for resist removal after etching of the organic SOG layer with the use of adhesive tape
Terada, Y., Toyoda, E., Namikawa, M., Maekawa, A., Tokunaga, T.Year:
1999
Language:
english
DOI:
10.1109/issm.1999.808794
File:
PDF, 6 KB
english, 1999