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UV-Cured Hafnium Oxide-Based Gate Dielectrics for Low-Voltage Organic and Amorphous Oxide Thin-Film Transistors
Byun, Hye-Ran, Ha, Young-GeunVolume:
19
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2019.16329
Date:
July, 2019
File:
PDF, 1.70 MB
2019