Wet-chemical etching of metals for advanced semiconductor...

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Electrochimica Acta 2019 / 3

Wet-chemical etching of metals for advanced semiconductor technology nodes Ru etching in acidic Ce4+ solutions

Philipsen, Harold, Mouwen, Nils, Teck, Sander, Monnens, Wouter, Le, Quoc Toan, Holsteyns, Frank, Struyf, Herbert
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Journal:
Electrochimica Acta
DOI:
10.1016/j.electacta.2019.03.065
Date:
March, 2019
File:
PDF, 18.54 MB
2019
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