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Potential Precursor Alternatives to the Pyrophoric Trimethyl Aluminum for the Atomic Layer Deposition of Aluminum Oxide
Mai, Lukas, Boysen, Nils, Zanders, David, de los Arcos, Teresa, Mitschker, Felix, Mallick, Bert, Grundmeier, Guido, Awakowicz, Peter, Devi, AnjanaJournal:
Chemistry – A European Journal
DOI:
10.1002/chem.201900475
Date:
March, 2019
File:
PDF, 2.07 MB
2019