Impact of In-Situ Atomic-Layer-Deposition TiN/High- κ stack...

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Japanese Journal of Applied Physics 2019 / 02

Impact of In-Situ Atomic-Layer-Deposition TiN/High- κ stack onto In0.53Ga0.47As MOSCAPs on 300 mm Si Substrate

Kim, Jun-Gyu, Kwon, Hyuk-Min, Kim, Dae-Hyun, Kim, Taewoo
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Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/1347-4065/ab0519
Date:
February, 2019
File:
PDF, 1.18 MB
english, 2019
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