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Effect of thermal annealing on the strain and microstructures of in-situ phosphorus-doped Si1−xCx films grown on blanket and patterned silicon wafers
Kim, Sun-Wook, Lee, Minhyeong, Jang, Hyunchul, Lee, Hoo-Jeong, Ko, Dae-HongLanguage:
english
Journal:
Journal of Alloys and Compounds
DOI:
10.1016/j.jallcom.2019.03.015
Date:
March, 2019
File:
PDF, 843 KB
english, 2019